JPH065416Y2 - プラズマcvd窒化膜成長装置 - Google Patents
プラズマcvd窒化膜成長装置Info
- Publication number
- JPH065416Y2 JPH065416Y2 JP10094788U JP10094788U JPH065416Y2 JP H065416 Y2 JPH065416 Y2 JP H065416Y2 JP 10094788 U JP10094788 U JP 10094788U JP 10094788 U JP10094788 U JP 10094788U JP H065416 Y2 JPH065416 Y2 JP H065416Y2
- Authority
- JP
- Japan
- Prior art keywords
- nitride film
- plasma cvd
- growth apparatus
- film growth
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Separation Of Gases By Adsorption (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10094788U JPH065416Y2 (ja) | 1988-07-28 | 1988-07-28 | プラズマcvd窒化膜成長装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10094788U JPH065416Y2 (ja) | 1988-07-28 | 1988-07-28 | プラズマcvd窒化膜成長装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0222365U JPH0222365U (en]) | 1990-02-14 |
JPH065416Y2 true JPH065416Y2 (ja) | 1994-02-09 |
Family
ID=31329490
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10094788U Expired - Lifetime JPH065416Y2 (ja) | 1988-07-28 | 1988-07-28 | プラズマcvd窒化膜成長装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH065416Y2 (en]) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2571176B2 (ja) * | 1992-06-09 | 1997-01-16 | 株式会社荏原製作所 | Cvd法排ガスの除害方法 |
-
1988
- 1988-07-28 JP JP10094788U patent/JPH065416Y2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH0222365U (en]) | 1990-02-14 |
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